Inventor
Teis Johan Coenen
Inventor
Vught, NL
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices21%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light21%
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
H01JElectric discharge tubes or discharge lamps14%
H05HPlasma technique14%
G01BMeasuring length, thickness or similar linear dimensions7%
H05GX-ray technique7%
PatentTitleYear
10,996,568Methods and apparatus for metrology202110,725,387Determining an edge roughness parameter of a periodic structure202010,670,974Metrology apparatus for and a method of determining a characteristic of interest of a structure on a substrate202010,103,508Electron injector and free electron laser20189,853,412Radiation source20179,728,931'Electron injector and free electron laser'2017Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2017–2021Patents assigned to ASML NETHERLANDS BV (6)· patent assignee history
2017–2021Based in Vught, NL· patent location history
2017–2018Based in Veldhoven, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 6 | 2017–2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Vught, NL | 4 | 2017–2021 |
| Veldhoven, NL | 2 | 2017–2018 |