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Inventor

Ayako Tani

Inventor
Tokyo, JP

Overview

2→
Patents
2018
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
9,971,238Mask blank, phase shift mask, and production method thereof20189,874,808Mask blank, mask blank with negative resist film, phase shift mask, and method for producing pattern formed body using same2018

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2018Patents assigned to DAINIPPON PRINTING CO LTD (2)· patent assignee history
2018Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DAINIPPON PRINTING CO LTD22018
Locations
LocationPatentsSpan
Tokyo, JP22018