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Inventor

Masamichi Kobayashi

Inventor
Saitama, JP

Overview

27→
Patents
1987–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 27 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
H10DInorganic electric semiconductor devices9%
B67DDispensing, delivering or transferring liquids, not otherwise provided for8%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure8%
B65DContainers for storage or transport of articles or materials, e.g. bags, barrels, bottles, boxes, cans, cartons, crates, drums, jars, tanks, hoppers, forwarding containers6%
H01LSemiconductor devices6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
B41MPrinting, duplicating, marking, or copying processes5%
F16LPipes5%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light5%
PatentTitleYear
10,724,664Connector202010,682,648Plug-integrating container202010,580,911Photovoltaic element202010,551,267Diaphragm type pressure detection device202010,505,055Photoelectric conversion element201910,481,028Pressure detection device201910,422,712Pressure detection device and pressure sensor201910,274,391Pressure detection device201910,222,286Pressure detecting device having a mounting mechanism201910,173,883Connector, socket, and liquid storing container201910,118,813Connector and socket201810,088,088Connector and socket201810,000,371Connector and socket20189,517,925'Valve-integrating container, liquid withdrawing device equipped with the same, and method for manufacturing valve-integrating container'20168,287,121'Inkjet recording medium and method of producing same'20127,984,983'Inkjet recording method'20117,981,491'Package for ink jet recording medium'20117,862,863'Method for manufacturing an inkjet recording medium'20117,402,473'Semiconductor device and process for producing the same'20086,881,646'Semiconductor device and process for producing the same'20056,559,027'Semiconductor device and process for producing the sme'20036,432,790'Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device'20026,242,323'Semiconductor device and process for producing the same'20016,057,241'Method of manufacturing a semiconductor integrated circuit device'2000RE034378'Light emitting device with improved electrode structure to minimize short circuiting'19934,785,455'Light emitting device with improved electrode structure to minimize short circuiting'19884,692,927'Light emitting device with improved electrode structure to minimize short circuiting'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1987–2003Patents assigned to HITACHI LTD (6)· patent assignee history
1987–1988Based in Maebashi, JP· patent location history
1993–2008Based in Kodaira, JP· patent location history
2000–2008Patents assigned to HITACHI ULSI SYS CO LTD (5)· patent assignee history
2011–2012Patents assigned to FUJIFILM CORP (4)· patent assignee history
2011Based in Shizuoka, JP· patent location history
2016–2020Patents assigned to SURPASS IND CO LTD (12)· patent assignee history
2016–2020Based in Saitama, JP· patent location history
2019–2020Patents assigned to SHARP KK (2)· patent assignee history
2019–2020Based in Sakai, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SURPASS IND CO LTD122016–2020
HITACHI LTD61987–2003
HITACHI ULSI SYS CO LTD52000–2008
FUJIFILM CORP42011–2012
SHARP KK22019–2020
Locations
LocationPatentsSpan
Saitama, JP122016–2020
Kodaira, JP71993–2008
Sakai, JP22019–2020
Shizuoka, JP22011
Maebashi, JP21987–1988