Inventor
SATOSHI SHIMMURA
Inventor
JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
B05CApparatus for applying fluent materials to surfaces, in general20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
B08BCleaning in general15%
B05BSpraying apparatus10%
H01LSemiconductor devices10%
PatentTitleYear
12,257,611Cleaning jig, coating apparatus, and cleaning method202511,868,057Solution treatment apparatus and cleaning method202411,862,485Nozzle standby device, liquid processing apparatus and operation method of liquid processing apparatus202411,273,464Substrate processing apparatus202211,235,350Solution treatment apparatus and cleaning method for solution treatment apparatus2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TOKYO ELECTRON LTD (5)· patent assignee history
2022–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 5 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 5 | 2022–2025 |