Inventor
Boris Yokhin
Inventor
Yoqneam, IL
Overview
Patents· 37 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties64%
G01BMeasuring length, thickness or similar linear dimensions14%
G01TMeasurement of nuclear or x-radiation10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
G21KHandling of particles or ionising radiation not otherwise provided for2%
H01JElectric discharge tubes or discharge lamps2%
H01LSemiconductor devices2%
PatentTitleYear
9,390,984'X-ray inspection of bumps on a semiconductor substrate'20168,731,138'High-resolution X-ray diffraction measurement with enhanced sensitivity'20148,437,450'Fast measurement of X-ray diffraction from tilted layers'20138,243,878'High-resolution X-ray diffraction measurement with enhanced sensitivity'20127,804,934'Accurate measurement of layer dimensions using XRF'20107,680,243'X-ray measurement of properties of nano-particles'20107,653,174'Inspection of small features using X-ray fluorescence'20107,649,978'Automated selection of X-ray reflectometry measurement locations'20107,600,916'Target alignment for X-ray scattering measurements'20097,551,719'Multifunction X-ray analysis system'20097,481,579'Overlay metrology using X-rays'20097,483,513'Measurement of properties of thin films on sidewalls'20097,474,732'Calibration of X-ray reflectometry system'20097,321,652'Multi-detector EDXRD'20087,245,695'Detection of dishing and tilting using X-ray fluorescence'20077,231,016'Efficient measurement of diffuse X-ray reflections'20077,120,228'Combined X-ray reflectometer and diffractometer'20067,113,566'Enhancing resolution of X-ray measurements by sample motion'20067,110,491'Measurement of critical dimensions using X-ray diffraction in reflection mode'20067,103,142'Material analysis using multiple X-ray reflectometry models'20067,076,024'X-ray apparatus with dual monochromators'20067,068,753'Enhancement of X-ray reflectometry by measurement of diffuse reflections'20067,035,375'X-ray scattering with a polychromatic source'20066,947,520'Beam centering and angle calibration for X-ray reflectometry'20056,907,108'Dual-wavelength x-ray monochromator'20056,895,075'X-ray reflectometry with small-angle scattering measurement'20056,895,071'XRR detector readout processing'20056,680,996'Dual-wavelength X-ray reflectometry'20046,639,968'X-ray reflectometer'20036,556,652'Measurement of critical dimensions using X-rays'20036,535,575'Pulsed X-ray reflectometer'20036,512,814'X-ray reflectometer'20036,453,002'Differential measurement of X-ray microfluorescence'20026,389,102'X-ray array detector'20026,381,303'X-ray microanalyzer for thin films'20026,108,398'X-ray microfluorescence analyzer'20006,041,095'X-ray fluorescence analyzer'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2009Patents assigned to JORDAN VALLEY APPLIED RADIATION LTD (24)· patent assignee history
2000–2016Based in Yoqneam, IL· patent location history
2008–2016Patents assigned to JORDAN VALLEY SEMICONDUCTORS (11)· patent assignee history
2012–2014Patents assigned to BERMAN DAVID (3)· patent assignee history
2012–2014Patents assigned to WORMINGTON MATTHEW (3)· patent assignee history
2012–2014Patents assigned to YOKHIN BORIS (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JORDAN VALLEY APPLIED RADIATION LTD | 24 | 2000–2009 |
| JORDAN VALLEY SEMICONDUCTORS | 11 | 2008–2016 |
| BERMAN DAVID | 3 | 2012–2014 |
| WORMINGTON MATTHEW | 3 | 2012–2014 |
| YOKHIN BORISself | 3 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yoqneam, IL | 37 | 2000–2016 |