Inventor
Hitoshi Yamato
Inventor
Takarazuka, JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices21%
C07CAcyclic or carbocyclic compounds19%
C07DHeterocyclic compounds15%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests15%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium2%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%
G03GElectrography2%
H01LSemiconductor devices2%
PatentTitleYear
10,079,346Heteroaromatic compounds for organic electronics20189,865,823'Quinolinium dyes with fluorinated counter anion for dye sensitized solar cells'20189,005,871'Sulfonium derivatives and the use therof as latent acids'20158,652,752'Sulphonium salt initiators'20148,580,478'Latent acids and their use'20138,512,934'Sulphonium salt initiators'20138,241,822'Halogenated oxime derivatives and the use therof as latent acids'20127,687,220'Oxime derivatives and use thereof as latent acids'20107,399,577'Halogenated oxime derivatives and the use thereof'20087,326,511'Sulfonate derivatives and the use thereof as latent acids'20087,244,544'Oxime derivatives and the use thereof as latent acids'20077,026,094'Substituted oxime derivatives and the use thereof as latent acids'20066,986,981'Oxime derivatives and the use thereof as latent acids'20066,929,896'Onium salts and the use therof as latent acids'20056,806,024'Oxime derivatives and the use thereof as photoinitiators'20046,770,420'Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity'20046,703,182'Unsaturated oxime derivatives and the use thereof as latent acids'20046,673,850'Photoinitiators and their applications'20046,512,020'Oxime derivatives and the use thereof as latent acids'20036,485,886'Oxime derivatives and the use thereof as latent acids'20026,458,864'Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers'20026,306,555'Iodonium salts as latent acid donors'20016,261,738'Oxime derivatives and the use thereof as latent acids'20016,004,724'Oxime sulfonates and the use thereof as latent sulfonic acids'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2010Patents assigned to CIBA SC HOLDING AG (17)· patent assignee history
1999–2004Based in Hyogo, JP· patent location history
2001–2018Based in Takarazuka, JP· patent location history
2012–2018Patents assigned to BASF SE (7)· patent assignee history
2012–2015Patents assigned to YAMATO HITOSHI (5)· patent assignee history
2012–2015Patents assigned to ASAKURA TOSHIKAGE (4)· patent assignee history
2013–2014Patents assigned to HAYOZ PASCAL (2)· patent assignee history
2018Based in Takarazuki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CIBA SC HOLDING AG | 17 | 1999–2010 |
| BASF SE | 7 | 2012–2018 |
| YAMATO HITOSHIself | 5 | 2012–2015 |
| ASAKURA TOSHIKAGE | 4 | 2012–2015 |
| HAYOZ PASCAL | 2 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Takarazuka, JP | 17 | 2001–2018 |
| Hyogo, JP | 6 | 1999–2004 |
| Takarazuki, JP | 1 | 2018 |