Inventor
Tsutomu Karimata
Inventor
Kanagawa, JP
Overview
Patents· 52 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps35%
G01NInvestigating or analysing materials by determining their chemical or physical properties29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
G01RMeasuring electric variables4%
B82YSpecific uses or applications of nanostructures3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
H01LSemiconductor devices2%
C23CCoating metallic material1%
F16KValves1%
PatentTitleYear
10,900,573Gate valve202110,157,722Inspection device20189,601,302'Inspection apparatus'20179,406,480'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20169,368,314'Inspection system by charged particle beam and method of manufacturing devices using the system'20169,134,261'Inspection apparatus'20158,946,631'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20158,884,225'Sample observing device and sample observing method'20148,822,919'Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former'20148,803,103'Inspection system by charged particle beam and method of manufacturing devices using the system'20148,796,621'Detector and inspecting apparatus'20148,742,341'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20148,497,476'Inspection device'20138,431,892'Detector and inspecting apparatus'20138,368,031'Inspection system by charged particle beam and method of manufacturing devices using the system'20138,053,726'Inspection system by charged particle beam and method of manufacturing devices using the system'20117,928,382'Detector and inspecting apparatus'20117,928,378'Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former'20117,888,642'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20117,863,580'Electron beam apparatus and an aberration correction optical apparatus'20117,829,871'Sheet beam-type testing apparatus'20107,745,784'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20107,741,601'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20107,601,972'Inspection system by charged particle beam and method of manufacturing devices using the system'20097,569,838'Electron beam inspection system and inspection method and method of manufacturing devices using the system'20097,439,502'Electron beam apparatus and device production method using the electron beam apparatus'20087,423,267'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20087,417,236'Sheet beam-type testing apparatus'20087,411,191'Inspection system by charged particle beam and method of manufacturing devices using the system'20087,408,175'Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former'20087,365,324'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20087,351,969'Electron beam inspection system and inspection method and method of manufacturing devices using the system'20087,352,195'Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus'20087,297,949'Inspection system by charged particle beam and method of manufacturing devices using the system'20077,247,848'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20077,244,932'Electron beam apparatus and device fabrication method using the electron beam apparatus'20077,241,993'Inspection system by charged particle beam and method of manufacturing devices using the system'20077,223,973'Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former'20077,212,017'Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus'20077,176,459'Electron beam apparatus'20077,138,629'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20067,135,676'Inspection system by charged particle beam and method of manufacturing devices using the system'20067,129,485'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20067,109,483'Method for inspecting substrate, substrate inspecting system and electron beam apparatus'20067,109,484'Sheet beam-type inspection apparatus'20067,095,022'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20067,049,585'Sheet beam-type testing apparatus'20066,992,290'Electron beam inspection system and inspection method and method of manufacturing devices using the system'20066,858,084'Plating apparatus and method'20056,855,929'Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former'20056,716,330'Electroless plating apparatus and method'20046,593,152'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2021Patents assigned to EBARA CORP (48)· patent assignee history
2003–2016Based in Kanagawa, JP· patent location history
2004–2016Based in Yokohama, JP· patent location history
2006–2014Patents assigned to TOSHIBA KK (11)· patent assignee history
2011–2021Based in Tokyo, JP· patent location history
2013–2014Patents assigned to HATAKEYAMA MASAHIRO (5)· patent assignee history
2013–2014Patents assigned to KARIMATA TSUTOMU (5)· patent assignee history
2013–2014Patents assigned to YOSHIKAWA SHOJI (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EBARA CORP | 48 | 2003–2021 |
| TOSHIBA KK | 11 | 2006–2014 |
| HATAKEYAMA MASAHIRO | 5 | 2013–2014 |
| KARIMATA TSUTOMUself | 5 | 2013–2014 |
| YOSHIKAWA SHOJI | 5 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 35 | 2003–2016 |
| Tokyo, JP | 10 | 2011–2021 |
| Yokohama, JP | 7 | 2004–2016 |