Inventor
Keita Sakai
Inventor
Utsunomiya, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
B41JTypewriters11%
C30BSingle-crystal growth6%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
Y10TTechnical subjects covered by former us classification6%
B29CShaping or joining of plastics3%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts3%
B62MRider propulsion of wheeled vehicles or sledges3%
PatentTitleYear
9,947,146Information processing system for electric two-wheeled vehicle, electric two-wheeled vehicle, electric equipment unit, and key for electric two-wheeled vehicle20189,829,789Method for determining pattern of mold for imprint, imprint method, and apparatus20179,164,395'Exposure apparatus, and method of manufacturing a device'20157,754,011'Method of manufacturing a calcium fluoride single crystal'20107,714,980'Exposure apparatus, exposure method, and exposure system'20107,705,966'Immersion exposure apparatus'20107,394,522'Exposure apparatus and device manufacturing method'20087,105,049'Method of manufacturing single crystal calcium fluoride'20066,529,226'Thermal printer and driving device for the same'20036,479,212'Photosensitive resin, resist composition using the photosensitive resin, pattern formation method using the resist composition, device produced by the pattern formation method, and exposure method'20026,331,383'Patterning method, and method for manufacturing semiconductor device'20016,288,737'Thermal printer and drive thereof'20016,270,270'Printing apparatus'20016,225,019'Photosensitive resin, resist based on the photosensitive resin, exposure apparatus and exposure method using the resist, and semiconductor device obtained by the exposure method'20016,087,076'Method of manufacturing semiconductor devices by performing coating, heating, exposing and developing in a low-oxygen or oxygen free controlled environment'20006,008,942'Diffractive optical element and optical instrument having the same'19995,952,149'Resist solution for photolithography including a base resin and an oxygen-free or low-oxygen solvent'19995,588,092'Printer control circuit and the printer controlled thereby'19965,093,673'Thermal line printer with external memory means'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–2003Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (5)· patent assignee history
1992–1996Based in Neyagawa, JP· patent location history
1999–2017Patents assigned to CANON KK (13)· patent assignee history
1999–2017Based in Utsunomiya, JP· patent location history
2001–2018Based in Osaka, JP· patent location history
2001Based in Kadoma, JP· patent location history
2010Based in Tochigi, JP· patent location history
2015Patents assigned to HASEGAWA NORIYASU (1)· patent assignee history
2015Patents assigned to HAYASHI TATSUYA (1)· patent assignee history
2018Patents assigned to PANASONIC IP MAN CO LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 13 | 1999–2017 |
| MATSUSHITA ELECTRIC INDUSTRIAL CO LTD | 5 | 1992–2003 |
| HASEGAWA NORIYASU | 1 | 2015 |
| HAYASHI TATSUYA | 1 | 2015 |
| PANASONIC IP MAN CO LTD | 1 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Utsunomiya, JP | 12 | 1999–2017 |
| Osaka, JP | 3 | 2001–2018 |
| Neyagawa, JP | 2 | 1992–1996 |
| Tochigi, JP | 1 | 2010 |
| Kadoma, JP | 1 | 2001 |