Inventor
John Kalamen
Inventor
Loveland, CO, US
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B41Cprimary
B41CProcesses for the manufacture or reproduction of printing surfaces29%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices21%
B41MPrinting, duplicating, marking, or copying processes16%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests16%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
B41NPrinting plates or foils3%
C08LCompositions of macromolecular compounds3%
C09DCoating compositions, e.g. paints, varnishes or lacquers3%
G03CPhotosensitive materials for photographic purposes3%
Y10TTechnical subjects covered by former us classification3%
PatentTitleYear
8,257,907'Negative-working imageable elements'20128,084,182'On-press developable elements and methods of use'20117,247,418'Imageable members with improved chemical resistance'20077,163,777'Thermally sensitive imageable element'20077,060,416'Positive-working, thermally sensitive imageable element'20067,056,639'Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid'20067,014,983'Multilayer imageable element'20066,981,446'Ink-jet imaging method'20066,942,957'Ionic liquids as developability enhancing agents in multilayer imageable elements'20056,939,663'Sulfated phenolic resins and printing plate precursors comprising sulfated phenolic resins'20056,806,020'Negative working imageable composition containing sulfonic acid'20046,794,107'Thermal generation of a mask for flexography'20045,925,498'Photosensitive polymer composition and element containing photosensitive polyamide and mixture of acrylates'19995,879,858'Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2005Patents assigned to KODAK POLYCHROME GRAPHICS LLC (6)· patent assignee history
1999–2012Based in Loveland, CO, US· patent location history
2006–2012Patents assigned to EASTMAN KODAK CO (8)· patent assignee history
2011–2012Patents assigned to KALAMEN JOHN (2)· patent assignee history
2011Patents assigned to MUNNELLY HEIDI M (1)· patent assignee history
2012Patents assigned to CLARK ERIC E (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EASTMAN KODAK CO | 8 | 2006–2012 |
| KODAK POLYCHROME GRAPHICS LLC | 6 | 1999–2005 |
| KALAMEN JOHNself | 2 | 2011–2012 |
| CLARK ERIC E | 1 | 2012 |
| MUNNELLY HEIDI M | 1 | 2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Loveland, CO, US | 14 | 1999–2012 |