Inventor
TOYOHISA TSURUDA
Inventor
JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
G01BMeasuring length, thickness or similar linear dimensions17%
G06TImage data processing or generation, in general13%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
H01LSemiconductor devices11%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light4%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
G05BControl or regulating systems in general4%
B05CApparatus for applying fluent materials to surfaces, in general2%
B05DProcesses for applying fluent materials to surfaces, in general2%
PatentTitleYear
12,467,742Film thickness analysis method, film thickness analysis device and storage medium202512,442,635Substrate processing apparatus, substrate processing method, and storage medium202512,406,350Estimation model creation device, estimation model creation method, and storage medium202512,300,526Substrate processing control method, substrate processing apparatus and storage medium202512,228,390Information processing apparatus, information processing method and computer-readable recording medium202512,123,778Thermal imaging sensor for integration into track system202412,051,189Estimation model creation device, estimation model creation method, and storage medium202411,876,022Substrate treatment method and substrate treatment system202411,862,496Substrate processing control method, substrate processing apparatus and storage medium202411,703,459System and method to calibrate a plurality of wafer inspection system (WIS) modules202311,636,579Information processing method, information processing apparatus and computer-readable recording medium202311,555,691Substrate inspection system, substrate inspection method and recording medium202311,544,864Shape characteristic value estimation apparatus, shape characteristic value estimation method, and storage medium202311,461,885Substrate inspection method, substrate inspection system, and control apparatus2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TOKYO ELECTRON LTD (14)· patent assignee history
2022–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 14 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 14 | 2022–2025 |