Inventor
Kazuaki Niwa
Inventor
Tokyo, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices46%
H10KOrganic electric solid-state devices15%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests15%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients8%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein8%
H05KPrinted circuits8%
PatentTitleYear
6,994,944'Radiation sensitive resin composition, cathode separator and EL display device'20066,984,476'Radiation-sensitive resin composition, forming process for forming patterned insulation film, active matrix board and flat-panel display device equipped with the same, and process for producing flat-panel display device'20066,852,476'Radiation sensitive resin composition, rib, rib forming method and display element'20056,797,450'Radiation-sensitive composition, insulating film and organic EL display element'20046,797,453'Radiation sensitive composition for forming an insulating film, insulating film and display device'20046,048,666'Radiation sensitive resin composition'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2006Patents assigned to JSR CORP (6)· patent assignee history
2000–2006Based in Tokyo, JP· patent location history
2006Based in Chuo-ku, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JSR CORP | 6 | 2000–2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 5 | 2000–2006 |
| Chuo-ku, JP | 1 | 2006 |