Inventor

Hsien-Yeh Chen

Inventor
Taipei, TW

Overview

8→
Patents
2011–2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B05Dprimary
B05DProcesses for applying fluent materials to surfaces, in general16%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds16%
C09DCoating compositions, e.g. paints, varnishes or lacquers13%
C23CCoating metallic material10%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry6%
C07CAcyclic or carbocyclic compounds6%
C08LCompositions of macromolecular compounds6%
Y10TTechnical subjects covered by former us classification6%
A61LMethods or apparatus for sterilising materials or objects in general3%
B29BPreparation or pretreatment of the material to be shaped3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011Patents assigned to UNIV MICHIGAN (2)· patent assignee history
2011Based in Ann Arbor, MI, US· patent location history
2016Patents assigned to UNIV NAT TAIWAN (1)· patent assignee history
2016–2019Based in Taipei, TW· patent location history
2017Patents assigned to CHEN HSIEN-YEH (1)· patent assignee history
2018–2019Patents assigned to MAY HWA ENTPR CORPORATION (3)· patent assignee history
2018Patents assigned to MAY-HWA ENTPR CORPORATION (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MAY HWA ENTPR CORPORATION32018–2019
UNIV MICHIGAN22011
CHEN HSIEN-YEHself12017
MAY-HWA ENTPR CORPORATION12018
UNIV NAT TAIWAN12016
Locations
LocationPatentsSpan
Taipei, TW62016–2019
Ann Arbor, MI, US22011