Inventor
Yasuo ASADA
Inventor
JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices44%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1044%
H01JElectric discharge tubes or discharge lamps11%
PatentTitleYear
11,784,054Etching method and substrate processing system202311,373,874Etching method and apparatus202211,342,192Substrate processing method and storage medium202211,189,498Method of etching silicon-containing film, computer-readable storage medium, and apparatus for etching silicon-containing film2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2023Patents assigned to TOKYO ELECTRON LTD (4)· patent assignee history
2021–2023Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 4 | 2021–2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 4 | 2021–2023 |