Inventor
Tamihiro Kobayashi
Inventor
Tokyo, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H01JElectric discharge tubes or discharge lamps13%
H01LSemiconductor devices13%
H04NPictorial communication, e.g. television13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
PatentTitleYear
11,082,619Imaging device and control method for imaging device202110,867,819Vacuum processing apparatus, vacuum processing system and vacuum processing method20207,799,134'Shower plate having projections and plasma CVD apparatus using same'20107,690,881'Substrate-processing apparatus with buffer mechanism and substrate-transferring apparatus'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010Patents assigned to ASM JAPAN (2)· patent assignee history
2010Based in Tama, JP· patent location history
2020Patents assigned to TOKYO ELECTRON LTD (1)· patent assignee history
2020–2021Based in Tokyo, JP· patent location history
2021Patents assigned to OLYMPUS CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASM JAPAN | 2 | 2010 |
| OLYMPUS CORP | 1 | 2021 |
| TOKYO ELECTRON LTD | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 2 | 2020–2021 |
| Tama, JP | 2 | 2010 |