Inventor
Wonchul Lee
Inventor
San Ramon, CA, US
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
H01LSemiconductor devices22%
H01JElectric discharge tubes or discharge lamps10%
H10BElectronic memory devices10%
H10DInorganic electric semiconductor devices10%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
G06FElectric digital data processing6%
G11CStatic stores6%
C23CCoating metallic material2%
PatentTitleYear
10,720,435Semiconductor devices including support patterns202010,347,641Semiconductor devices201910,340,277Semiconductor devices including support patterns20199,607,848'Etch process with pre-etch transient conditioning'20179,530,658'Continuous plasma etch process'20169,519,576'Memory controller, method of operating the same and memory system including the same'20169,379,114'Semiconductor device and method of fabricating the same'20169,348,708'Memory system performing address mapping according to bad page map'20169,257,296'Etch process with pre-etch transient conditioning'20169,213,598'Nonvolatile memory device and method of operating the same'20159,142,417'Etch process with pre-etch transient conditioning'20159,129,902'Continuous plasma ETCH process'20159,059,116'Etch with pulsed bias'20158,969,936'Semiconductor devices having increased contact areas between contacts and active regions and methods of fabricating the same'20158,802,571'Method of hard mask CD control by Ar sputtering'20148,609,546'Pulsed bias plasma process to control microloading'20138,518,282'Method of controlling etch microloading for a tungsten-containing layer'20138,124,538'Selective etch of high-k dielectric material'20127,629,255'Method for reducing microloading in etching high aspect ratio structures'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2017Patents assigned to LAM RES CORP (11)· patent assignee history
2009–2012Based in Fremont, CA, US· patent location history
2012–2016Patents assigned to LEE WONCHUL (7)· patent assignee history
2012–2015Patents assigned to FU QIAN (5)· patent assignee history
2012–2013Patents assigned to LIU SHENJIAN (3)· patent assignee history
2013–2017Based in San Ramon, CA, US· patent location history
2015–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (8)· patent assignee history
2015–2020Based in Seongnam-si, KR· patent location history
2015–2016Based in Yongin-si, KR· patent location history
2016Based in Gyeonggi-do, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 11 | 2009–2017 |
| SAMSUNG ELECTRONICS CO LTD | 8 | 2015–2020 |
| LEE WONCHULself | 7 | 2012–2016 |
| FU QIAN | 5 | 2012–2015 |
| LIU SHENJIAN | 3 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Ramon, California, US | 9 | 2013–2017 |
| Seongnam-si, KR | 5 | 2015–2020 |
| Yongin-si, KR | 2 | 2015–2016 |
| Fremont, California, US | 2 | 2009–2012 |
| Gyeonggi-do, KR | 1 | 2016 |