Inventor
Qingjun Zhou
Inventor
San Jose, CA, US
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H01LSemiconductor devices25%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1015%
H10DInorganic electric semiconductor devices13%
H01JElectric discharge tubes or discharge lamps7%
B64CAeroplanes2%
B64DEquipment for fitting in or to aircraft2%
E05BLocks2%
E05CBolts or fastening devices for wings, specially for doors or windows2%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
PatentTitleYear
11,060,331Engine door and latch assembly202110,840,138Selectively etched self-aligned via processes202010,770,568Method to remove III-V materials in high aspect ratio structures202010,741,393Methods for bottom up fin structure formation202010,692,728Use of selective aluminum oxide etch202010,593,594Selectively etched self-aligned via processes202010,510,540Mask scheme for cut pattern flow with enlarged EPE window201910,510,602Methods of producing self-aligned vias201910,439,047Methods for etch mask and fin structure formation201910,204,781Methods for bottom up fin structure formation20199,818,621'Cyclic oxide spacer etch process'20179,721,807'Cyclic spacer etching process with improved profile control'20179,478,433'Cyclic spacer etching process with improved profile control'20169,368,370'Temperature ramping using gas distribution plate heat'20169,165,783'Method of patterning a low-k dielectric film'20159,093,389'Method of patterning a silicon nitride dielectric film'20158,802,572'Method of patterning a low-k dielectric film'20148,748,322'Silicon oxide recess etch'20147,790,047'Method for removing masking materials with reduced low-k dielectric material damage'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2020Patents assigned to APPLIED MATERIALS INC (14)· patent assignee history
2010Based in Sunnyvale, CA, US· patent location history
2014–2020Based in San Jose, CA, US· patent location history
2015Patents assigned to BELOSTOTSKIY SERGEY G (1)· patent assignee history
2015Patents assigned to LUBOMIRSKY DMITRY (1)· patent assignee history
2019–2020Patents assigned to MICROMATERIALS LLC (4)· patent assignee history
2021Patents assigned to MRA SYSTEMS LLC (1)· patent assignee history
2021Based in Shanghai, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 14 | 2010–2020 |
| MICROMATERIALS LLC | 4 | 2019–2020 |
| BELOSTOTSKIY SERGEY G | 1 | 2015 |
| LUBOMIRSKY DMITRY | 1 | 2015 |
| MRA SYSTEMS LLC | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 17 | 2014–2020 |
| Shanghai, CN | 1 | 2021 |
| Sunnyvale, California, US | 1 | 2010 |