Inventor
Wook-Hyoung Lee
Inventor
Seongnam-si, KR
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Bprimary
H10BElectronic memory devices29%
H10DInorganic electric semiconductor devices14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
LOC149%
G11CStatic stores6%
H04NPictorial communication, e.g. television6%
G06FElectric digital data processing3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
10,318,678Method of three-dimensional optoelectrical simulation of image sensor2019D0798836'Speaker'2017D0730350'Home gateway'2015D0730351'Home gateway'20158,630,140'Non-volatile memory device having reference cells, and related method of setting reference current'20148,537,255'Image sensors'20138,507,906'CMOS image sensor and method of manufacturing the same'20138,493,793'Nonvolatile memory device and erasure method thereof'20138,372,712'Memory device and method of manufacturing the same'20138,148,784'Semiconductor device having first and second device isolation layers formed of different insulation materials'20127,902,593'Memory device and method of manufacturing the same'20117,687,846'Nonvolatile memory device'20107,679,122'Semiconductor device including source strapping line'20107,550,363'Method of fabricating a semiconductor device having first and second trenches using non-concurrently formed hard mask patterns'20097,427,533'Methods of fabricating semiconductor devices including trench device isolation layers having protective insulating layers and related devices'20087,396,729'Methods of forming semiconductor devices having a trench with beveled corners'20087,384,845'Methods of fabricating flash memory devices including word lines with parallel sidewalls'20086,818,511'Non-volatile memory device to protect floating gate from charge loss and method for fabricating the same'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2019Patents assigned to SAMSUNG ELECTRONICS CO LTD (18)· patent assignee history
2004Based in Kyungki-do, KR· patent location history
2008–2010Based in Gyeonggi-do, KR· patent location history
2009–2014Based in Seongnam-si, KR· patent location history
2012–2015Patents assigned to LEE WOOK-HYOUNG (5)· patent assignee history
2013Based in Anyang-si, KR· patent location history
2015Patents assigned to CHOI JAE-WON (2)· patent assignee history
2015Patents assigned to GWON SOON-JAE (2)· patent assignee history
2015Patents assigned to HAN MI-RAN (2)· patent assignee history
2015–2019Based in Suwon-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 18 | 2004–2019 |
| LEE WOOK-HYOUNGself | 5 | 2012–2015 |
| CHOI JAE-WON | 2 | 2015 |
| GWON SOON-JAE | 2 | 2015 |
| HAN MI-RAN | 2 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seongnam-si, KR | 7 | 2009–2014 |
| Suwon-si, KR | 4 | 2015–2019 |
| Gyeonggi-do, KR | 4 | 2008–2010 |
| Anyang-si, KR | 2 | 2013 |
| Kyungki-do, KR | 1 | 2004 |