Inventor
Yiqiong Wang
Inventor
Morgan Hill, CA, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
B81BMicrostructural devices or systems, e.g. micromechanical devices13%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems13%
C23FNon-mechanical removal of metallic material from surface13%
H10BElectronic memory devices13%
PatentTitleYear
6,827,869'Method of micromachining a multi-part cavity'20046,593,244'Process for etching conductors at high etch rates'20036,380,095'Silicon trench etch using silicon-containing precursors to reduce or avoid mask erosion'20026,127,278'Etch process for forming high aspect ratio trenched in silicon'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2003Patents assigned to APPLIED MATERIALS INC (3)· patent assignee history
2000–2004Based in Morgan Hill, CA, US· patent location history
2003Based in San Jose, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 3 | 2000–2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Morgan Hill, California, US | 3 | 2000–2004 |
| San Jose, California, US | 1 | 2003 |