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Inventor

Naoki Dai

Inventor
Tokyo, JP

Overview

7→
Patents
2004–2014
Patent span
Chemistry
Primary field (CPC C)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
C23CCoating metallic material19%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests19%
C25DProcesses for the electrolytic or electrophoretic production of coatings14%
Y10TTechnical subjects covered by former us classification14%
PatentTitleYear
8,777,198'Substrate holding apparatus, substrate holding method, and substrate processing apparatus'20148,141,513'Substrate holding apparatus, substrate holding method, and substrate processing apparatus'20127,886,685'Substrate holding apparatus, substrate holding method, and substrate processing apparatus'20117,575,636'Substrate processing apparatus and substrate processing method'20097,442,257'Substrate processing apparatus and substrate processing method'20087,087,117'Substrate processing apparatus and substrate processing method'20066,824,613'Substrate processing apparatus'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2014Patents assigned to EBARA CORP (7)· patent assignee history
2004–2014Based in Tokyo, JP· patent location history
2012–2014Patents assigned to DAI NAOKI (2)· patent assignee history
2012–2014Patents assigned to KATO RYO (2)· patent assignee history
2012–2014Patents assigned to KATSUOKA SEIJI (2)· patent assignee history
2012–2014Patents assigned to KOBAYASHI KENICHI (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP72004–2014
DAI NAOKIself22012–2014
KATO RYO22012–2014
KATSUOKA SEIJI22012–2014
KOBAYASHI KENICHI22012–2014
Locations
LocationPatentsSpan
Tokyo, JP72004–2014