Inventor
Dong Lim Kim
Inventor
Seoul, KR
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H01LSemiconductor devices17%
C01GCompounds containing metals not covered by subclasses c01d or c01f8%
C04BLime, magnesia8%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
H01BCables8%
PatentTitleYear
9,115,287'Composition for manufacturing oxide semiconductor and method for manufacturing thin-film transistor substrate using the same'20158,859,331'Compositions used in formation of oxide material layers, methods of forming an oxide material layer using the same, and methods of fabricating a thin film transistor using same'20148,765,028'Composition for oxide thin film, method of preparing the composition, method of forming the oxide thin film, and electronic device using the composition'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2015Patents assigned to UNIV YONSEI IACF (3)· patent assignee history
2014Patents assigned to KIM DONG LIM (2)· patent assignee history
2014Patents assigned to KIM HYUN JAE (2)· patent assignee history
2014Patents assigned to RIM YOU SEUNG (2)· patent assignee history
2014Patents assigned to JUNG JOOHYE (1)· patent assignee history
2014–2015Based in Seoul, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNIV YONSEI IACF | 3 | 2014–2015 |
| KIM DONG LIMself | 2 | 2014 |
| KIM HYUN JAE | 2 | 2014 |
| RIM YOU SEUNG | 2 | 2014 |
| JUNG JOOHYE | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 3 | 2014–2015 |