Inventor
Walter Huber
Inventor
Traunstein, DE
Overview
Patents· 45 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Dprimary
G01DMeasuring not specially adapted for a specific variable45%
G01BMeasuring length, thickness or similar linear dimensions15%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
G02BOptical elements, systems or apparatus5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B01FMixing, e.g. dissolving, emulsifying or dispersing2%
B06BMethods or apparatus for generating or transmitting mechanical vibrations of infrasonic, sonic, or ultrasonic frequency, e.g. for performing mechanical work in general2%
C04BLime, magnesia2%
C07CAcyclic or carbocyclic compounds2%
PatentTitleYear
10,823,550Optical position measuring device202010,048,114Device for measuring the vibrational amplitude of a capillary tube of a wire bonder20189,823,058'Device for position determination'20179,739,598'Device for interferential distance measurement'20179,638,514'Optical position-measuring device'20179,400,168'Device for distance measurement'20169,080,857'Device for interferential distance measurement'20158,822,907'Optical position-measuring device having two crossed scales'20148,797,546'Interferometric distance measurement device using a scanning plate and transparent carrier substrate containing a reflector element'20148,465,805'Glass veneer on ceramics'20137,701,593'Optical position measuring arrangement'20107,297,935'Position-measuring device'20077,271,920'Position-measuring device'20077,196,431'Device for prompting a controller'20077,159,781'Scanning unit for a position measuring device'20077,154,609'Interferential position measuring arrangement'20066,943,341'Position measuring system'20056,621,069'Optical encoder with an electric fieldscreening grit'20036,552,810'Optical measuring system'20036,541,761'Optical position measuring system with a graduation that causes essentially only first orders of diffraction'20036,511,921'Methods for reducing the reactivity of a semiconductor substrate surface and for evaluating electrical properties of a semiconductor substrate'20036,198,534'Scanning unit for an optical position measuring system'20016,175,414'Optical position measuring device'20016,151,128'Optical position indicator'20005,986,066'Biosensory layers'19995,760,959'Interferential position measuring device with three detectors'19985,739,911'Position measuring system'19985,696,584'Phase grating having an unprotected relief structure with a grating structure that causes destructive interference of reflections'19975,689,336'Photoelectric position measuring system'19975,678,319'Index grating having partial fields that are geometrically offset in the measuring direction'19975,648,658'Apparatus and method for generating position-dependent signals using a scanning plate having a plurality of differently configured scanning regions'19975,646,302'Heterotrifunctional compounds for photoaffinity labelling'19975,519,492'Optical arrangement for detecting the intensity modulation of partial ray beams'19965,493,397'Multi-coordinate measuring system using a cross grating to create a plurality of diffraction beams emanating from two or more coordinate directions'19965,430,546'Optical device for measuring relative position of or angle between two objects'19955,424,833'Interferential linear and angular displacement apparatus having scanning and scale grating respectively greater than and less than the source wavelength'19955,264,915'Interferential measurement device for at least one direction of measurement'19935,206,704'Position measuring apparatus and method of use thereof'19934,988,864'Photoelectric angle measuring device with adjacent order interference'19914,868,133'Semiconductor wafer fabrication with improved control of internal gettering sites using RTA'19894,851,358'Semiconductor wafer fabrication with improved control of internal gettering sites using rapid thermal annealing'19894,768,878'Test arrangement for non-contacting identification of defects in non-structured surfaces'19884,623,942'Method and arrangement for detecting error signals in a disk-drive, and a magnetic test disk therefor'19864,333,356'Mixing apparatus'19824,165,219'Analysis of solutions using chromatographic column'1979Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1979–1986Patents assigned to BASF AG (2)· patent assignee history
1989Patents assigned to DNS ELECTRONIC MATERIALS INC (2)· patent assignee history
1989–2003Based in Sunnyvale, CA, US· patent location history
1991–2020Patents assigned to HEIDENHAIN GMBH DR JOHANNES (30)· patent assignee history
1991–2020Based in Traunstein, DE· patent location history
1997–1999Based in Kaiseraugst, CH· patent location history
2007Based in Darmstadt, DE· patent location history
2013Based in St. Ives, AU· patent location history
2014–2015Patents assigned to HUBER WALTER (3)· patent assignee history
2014–2015Patents assigned to HERMANN MICHAEL (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HEIDENHAIN GMBH DR JOHANNES | 30 | 1991–2020 |
| HUBER WALTERself | 3 | 2014–2015 |
| BASF AG | 2 | 1979–1986 |
| DNS ELECTRONIC MATERIALS INC | 2 | 1989 |
| HERMANN MICHAEL | 2 | 2014–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Traunstein, DE | 34 | 1991–2020 |
| Sunnyvale, California, US | 3 | 1989–2003 |
| Kaiseraugst, CH | 2 | 1997–1999 |
| St. Ives, AU | 1 | 2013 |
| Darmstadt, DE | 1 | 2007 |