Inventor
Tomoya Oori
Inventor
Kanagawa, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H10BElectronic memory devices17%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems8%
H01LSemiconductor devices8%
PatentTitleYear
10,325,920Method for manufacturing semiconductor device20198,765,362'Patterning method'20148,747,682'Pattern formation method and method for manufacturing semiconductor device'20148,329,385'Method of manufacturing a semiconductor device'20128,158,332'Method of manufacturing a semiconductor device'20128,138,059'Semiconductor device manufacturing method'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2014Patents assigned to OORI TOMOYA (5)· patent assignee history
2012–2014Patents assigned to TOSHIBA KK (5)· patent assignee history
2012–2014Patents assigned to MATSUNAGA KENTARO (4)· patent assignee history
2012–2014Patents assigned to SHIOBARA EISHI (3)· patent assignee history
2012Patents assigned to KATO HIROKAZU (1)· patent assignee history
2012Based in Kanagawa, JP· patent location history
2014Based in Mie, JP· patent location history
2019Based in Kuwana, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| OORI TOMOYAself | 5 | 2012–2014 |
| TOSHIBA KK | 5 | 2012–2014 |
| MATSUNAGA KENTARO | 4 | 2012–2014 |
| SHIOBARA EISHI | 3 | 2012–2014 |
| KATO HIROKAZU | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 3 | 2012 |
| Mie, JP | 2 | 2014 |
| Kuwana, JP | 1 | 2019 |