Inventor

Kouichi Aoyagi

Inventor
Takatsuki, JP

Overview

9→
Patents
2001–2021
Patent span
Physics
Primary field (CPC G)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
B29BPreparation or pretreatment of the material to be shaped9%
C08JWorking-up9%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
Y02WClimate change mitigation technologies related to wastewater treatment or waste management9%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations5%
C07BGeneral methods of organic chemistry5%
C07CAcyclic or carbocyclic compounds5%
C07DHeterocyclic compounds5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2003Patents assigned to RIGAKU IND CORP (3)· patent assignee history
2001–2012Based in Takatsuki, JP· patent location history
2012Patents assigned to AOYAGI KOUICHI (1)· patent assignee history
2012Patents assigned to JAPAN TOBACCO INC (1)· patent assignee history
2020Patents assigned to HITACHI CHEMICAL CO LTD (2)· patent assignee history
2020Based in Tokyo, JP· patent location history
2021Patents assigned to FUJIFILM CORP (2)· patent assignee history
2021Based in Shizuoka, JP· patent location history
2021Based in Haibara-gun, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
RIGAKU IND CORP32001–2003
FUJIFILM CORP22021
HITACHI CHEMICAL CO LTD22020
AOYAGI KOUICHIself12012
JAPAN TOBACCO INC12012
Locations
LocationPatentsSpan
Takatsuki, JP42001–2012
Shizuoka, JP22021
Tokyo, JP22020
Haibara-gun, JP12021