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Inventor

Hideo Hagiwara

Inventor
Hitachi, JP

Overview

27→
Patents
1986–2007
Patent span
Chemistry
Primary field (CPC C)

Patents· 27 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y10Sprimary
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests16%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
G11BInformation storage based on relative movement between record carrier and transducer12%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds11%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments11%
H05KPrinted circuits7%
C07CAcyclic or carbocyclic compounds4%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
C07DHeterocyclic compounds2%
PatentTitleYear
7,270,365'Spare tire storage structure'20077,153,631'Pattern-forming process using photosensitive resin composition'20066,991,210'Actuator for driving a valve'20066,309,791'Polyimide precursor, polyimide and their use'20016,197,475'Positive type photosensitive resin composition containing an alkali-soluble polymer and a compound which forms an amine compound with irradiation of light'20016,194,126'Pattern-forming process using photosensitive resin composition'20016,143,475'Polyimide precursor, polyimide and their use'20006,071,667'Photosensitive resin composition containing a photosensitive polyamide resin'20006,012,477'Circulating drainage system for sewage pipe installation work'20005,996,621'Circulating drainage system for sewage pipe installation work'19995,856,059'Photosensitive resin composition'19995,847,071'Photosensitive resin composition'19985,811,218'Photoinitiator compositions including amino acids, coumarin and titanocene and photosensitive materials using the same'19985,668,248'Photosensitive resin composition'19975,484,685'Naphthalocyanine derivatives, production thereof, optical recording medium using the same, and production thereof'19965,472,823'Photosensitive resin composition'19955,456,770'Amorphous magnetic alloy with high magnetic flux density'19955,284,943'Tatraazaporphin, process for producing the same, as well as optical recording media using the same and production processes thereof'19945,268,485'Naphthalocyanine derivatives, production thereof and optical recording medium using the same'19935,217,856'Tetraazaporphin, process for producing the same, as well as optical recording media using the same and production processes thereof'19935,214,188'2,3-dicyanonaphthalene derivatives'19935,110,968'Naphthalocyanine derivatives, production thereof, optical recording medium using the same, and production thereof'19925,075,203'Naphthalocyanine derivatives, production thereof and optical recording medium using the same'19915,039,600'Naphthalocyanine derivatives, production thereof, optical recording medium using the same, and production thereof'19915,034,309'Naphthalocyanine derivatives and their use in optical recording medium'19914,790,590'Corner bracket of side door for automobile'19884,593,814'Magnetic tape cassette storing case'1986

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1986Patents assigned to FUJI PHOTO FILM CO LTD (1)· patent assignee history
1991–2006Patents assigned to HITACHI CHEMICAL CO LTD (19)· patent assignee history
1991–1996Patents assigned to HITACHI LTD (3)· patent assignee history
1991–2006Based in Hitachi, JP· patent location history
1994Patents assigned to HITACHI CHEMICAL COMPANY CO (1)· patent assignee history
1999–2000Patents assigned to KOMATSU MFG CO LTD (2)· patent assignee history
1999–2000Based in Tokyo, JP· patent location history
2000–2001Based in Ibaraki, JP· patent location history
2006Based in Higashiosaka, JP· patent location history
2007Based in Sagamihara, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI CHEMICAL CO LTD191991–2006
HITACHI LTD31991–1996
KOMATSU MFG CO LTD21999–2000
FUJI PHOTO FILM CO LTD11986
HITACHI CHEMICAL COMPANY CO11994
Locations
LocationPatentsSpan
Hitachi, JP171991–2006
Ibaraki, JP32000–2001
Tokyo, JP21999–2000
Sagamihara, JP12007
Higashiosaka, JP12006