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Inventor

Martina J. Reale

Inventor
Palo Alto, CA, US

Overview

1→
Patents
2013
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus50%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
PatentTitleYear
8,413,080'Binary half-tone photolithographic optical apodization mask'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013Patents assigned to LOCKHEED CORP (1)· patent assignee history
2013Patents assigned to REALE MARTINA J (1)· patent assignee history
2013Patents assigned to SOMERSTEIN STEPHEN F (1)· patent assignee history
2013Based in Palo Alto, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LOCKHEED CORP12013
REALE MARTINA Jself12013
SOMERSTEIN STEPHEN F12013
Locations
LocationPatentsSpan
Palo Alto, California, US12013