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Inventor

DANE SIEVERS

Inventor
US

Overview

2→
Patents
2024–2026
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B05Cprimary
B05CApparatus for applying fluent materials to surfaces, in general17%
B05DProcesses for applying fluent materials to surfaces, in general17%
B82YSpecific uses or applications of nanostructures17%
C09DCoating compositions, e.g. paints, varnishes or lacquers17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
12,523,933Photoresist-free photolithography, photoprocessing tools, and methods with VUV or deep-UV lamps202612,011,736Methods and systems for large area and low defect monolayer ordering of microspheres and nanospheres2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2026Patents assigned to UNIV ILLINOIS (2)· patent assignee history
2024–2026Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
UNIV ILLINOIS22024–2026
Locations
LocationPatentsSpan
US22024–2026