Inventor
Reiko Nakamura
Inventor
New York, NY, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
A61Kprimary
A61KPreparations for medical, dental or toiletry purposes15%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations15%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests15%
A61LMethods or apparatus for sterilising materials or objects in general8%
C04BLime, magnesia8%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients8%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
LOC028%
LOC148%
Y10TTechnical subjects covered by former us classification8%
PatentTitleYear
D0792879'Virtual reality headset'2017D0715498'Oven mitt'20147,655,218'Methods and compositions for detection and diagnosis of infectious diseases'20106,979,450'Method and compositions for detection and diagnosis of infectious diseases'20056,476,104'Antimicrobial hydrogel forming absorbent polymers and process for making the same'20024,015,040'Construction material with calcium silicate monohydrate produced thereon in situ and composition therefor'1977Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977Patents assigned to INOUE SHIGEKI (1)· patent assignee history
1977Patents assigned to MARUYAMA TADANOBU (1)· patent assignee history
1977Patents assigned to NAKAMURA REIKO (1)· patent assignee history
1977Based in Tokyo, JP· patent location history
2002Based in Hyogo, JP· patent location history
2005–2010Patents assigned to JAPAN BCG LAB (2)· patent assignee history
2005–2010Based in Musashino, JP· patent location history
2014–2017Based in New York, NY, US· patent location history
2017Patents assigned to PARTICLE INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JAPAN BCG LAB | 2 | 2005–2010 |
| INOUE SHIGEKI | 1 | 1977 |
| MARUYAMA TADANOBU | 1 | 1977 |
| NAKAMURA REIKOself | 1 | 1977 |
| PARTICLE INC | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| New York, New York, US | 2 | 2014–2017 |
| Musashino, JP | 2 | 2005–2010 |
| Hyogo, JP | 1 | 2002 |
| Tokyo, JP | 1 | 1977 |