Inventor
MASAMI AKIMOTO
Inventor
JP
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
B08BCleaning in general17%
C23CCoating metallic material8%
B05BSpraying apparatus6%
B05CApparatus for applying fluent materials to surfaces, in general3%
B25JManipulators3%
C25DProcesses for the electrolytic or electrophoretic production of coatings3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
H05BElectric heating3%
PatentTitleYear
12,571,120Plating apparatus202612,557,591Linearly moving mechanism and method of suppressing particle scattering202612,463,064Substrate processing method and substrate processing apparatus202512,398,461Substrate cleaning apparatus and substrate cleaning method202512,276,027Substrate processing apparatus and substrate processing method202512,131,919Substrate cleaning apparatus and substrate cleaning method202411,637,035Substrate processing apparatus with moving device for connecting and disconnecting heater electrodes and substrate processing method thereof202311,551,945Substrate processing apparatus including periphery cover body202311,532,492Substrate processing apparatus and substrate processing method202211,510,284Substrate processing apparatus202211,208,725Substrate processing apparatus2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to TOKYO ELECTRON LTD (11)· patent assignee history
2021–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 11 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 11 | 2021–2026 |