Inventor
Isao Tafusa
Inventor
Miyagi, JP
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
C23CCoating metallic material17%
C30BSingle-crystal growth17%
H01LSemiconductor devices17%
H10BElectronic memory devices17%
Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2017Patents assigned to TOKYO ELECTRON LTD (2)· patent assignee history
2002Based in Yokohama, JP· patent location history
2017Based in Miyagi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 2 | 2002–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Miyagi, JP | 1 | 2017 |
| Yokohama, JP | 1 | 2002 |