LexDanaLexDanabeta
Inventor

Cheng-Hung Chen

Inventor
Shenzhen, CN

Overview

78→
Patents
2004–2020
Patent span
Physics
Primary field (CPC G)

Patents· 78 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Fprimary
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein16%
G09GArrangements or circuits for control of indicating devices using static means to present variable information13%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
H01LSemiconductor devices10%
G06FElectric digital data processing8%
H10DInorganic electric semiconductor devices8%
H01JElectric discharge tubes or discharge lamps6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
PatentTitleYear
10,811,225Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity202010,811,377Package structure with a barrier layer and method for forming the same202010,613,583Battery installation system and method therefor202010,551,692Array substrate and liquid crystal display panel202010,431,423Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity201910,359,695Method of fabricating an integrated circuit with non-printable dummy features201910,348,839Cloud management systems and device management methods thereof2019RE047432Output stage circuit201910,209,579Pixel electrode and array substrate2019D0840408Electronic device holder201910,170,276Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity201910,156,758Liquid crystal display201810,152,929Liquid crystal panels and the driving method thereof201810,146,074Liquid crystal device (LCD) and the manufacturing method thereof201810,101,827Method and apparatus for controlling a touch-screen based application ported in a smart device20189,935,130Pixel structure and liquid crystal display comprising the pixel structure20189,904,121'Array substrate, liquid crystal display panel, and its liquid crystal display device'20189,887,141'TFT switch and method for manufacturing the same'20189,885,927'Pixel electrode and liquid crystal display device'20189,881,496'Remote control system electronic device and remote control method'20189,791,728'Fixture for preventing deformation of glass panel of display module'20179,786,236'Liquid crystal panels and the driving methods thereof'20179,761,729'TFT switch and method for manufacturing the same'20179,735,073'TFT switch and method for manufacturing the same'20179,728,112'Array substrate, liquid crystal display panel, and detecting method of liquid crystal display panel'20179,680,025'TFT switch and method for manufacturing the same'20179,671,450'Array substrate, display panel and method for detecting the array substrate'20179,658,538'System and technique for rasterizing circuit layout data'20179,618,780'Stereoscopic display device, LCD panel, and array substrate'20179,594,862'Method of fabricating an integrated circuit with non-printable dummy features'20179,552,964'Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity'20179,548,035'Pixel structure having multiple switching units, liquid crystal display using the same, and driving method of the same'20179,508,304'Liquid crystal display panel and driving method thereof'20169,501,994'Liquid crystal display panel and driving method thereof'20169,465,241'Apparatus for applying curing voltages to liquid crystal substrate'20169,465,409'Docking station'20169,436,787'Method of fabricating an integrated circuit with optimized pattern density uniformity'20169,436,788'Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformity'20169,430,975'Array substrate and the liquid crystal panel'20169,293,073'Testing system'20169,282,633'Routing structure and display panel'20169,245,857'Chip package'20169,224,354'Liquid crystal display device and a pixel driving method thereof'20159,218,777'Array substrate and the liquid crystal panel'20159,164,337'Manufacturing method of display panel and repair line structure thereof'20159,159,279'Liquid crystal display device and display control method thereof'20159,158,170'LCD device, array substrate, and method of manufacturing the array substrate'20159,147,377'Method for image dithering for lithographic processes'20159,053,663'Array substrate and liquid crystal display panel'20159,054,277'Light-emitting diode with side-wall bump structure and mounting structure having the same'20159,048,243'Chip package'20159,007,556'Susbtrate with PSVA mode pad set and cell switch for array process of panel display device, manufacturing method and corresponding liquid crystal display device'20158,987,689'Efficient scan for E-beam lithography'20158,984,452'Long-range lithographic dose correction'20158,976,307'Patterned retarder 3D liquid crystal display and the manufacturing method thereof'20158,972,908'Method for electron beam proximity correction with improved critical dimension accuracy'20158,961,730'LCD device, manufacturing method and equipment for LCD panel'20158,963,899'Driver circuit for reducing IC malfunction and liquid crystal display panel comprising same'20158,945,803'Smart subfield method for E-beam lithography'20158,928,704'Array substrate and liquid crystal device with the same'20158,917,121'Output stage circuit'20148,896,640'Dislplay panel, flat-panel display device and driving method thereof'20148,877,410'Data process for E-beam lithography'20148,879,013'Thin-film transistor liquid crystal display device, substrate, and manufacturing method'20148,830,412'Substrate and manufacturing method of panel display device and corresponding liquid crystal display panel'20148,830,438'LCD panel and manufacturing method for the same'20148,823,440'Level shifting circuit with dynamic control'20148,778,573'Manufacturing method of transparent electrode and mask thereof'20148,704,978'LCD panel and fabricating method thereof'20148,638,412'Thin film transistor liquid crystal display device, substrate, and manufacturing method thereof'20148,609,308'Smart subfield method for E-beam lithography'20138,601,407'Geometric pattern data quality verification for maskless lithography'20138,563,224'Data process for E-beam lithography'20138,529,307'Detection circuit and manufacturing method for LCD panel'20137,969,580'Method and system for step-and-align interference lithography'20117,002,880'Optical disk drive with adaptive compensator'20066,952,383'Optical disc device with a wobble control circuit'20056,717,892'Optical disk drive with adaptive compensator'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2020Patents assigned to SHENZHEN CHINA STAR OPTOELECT (42)· patent assignee history
2013–2016Patents assigned to CHEN CHENG-HUNG (18)· patent assignee history
2013–2015Patents assigned to TAIWAN SEMICONDUCTOR MFG (8)· patent assignee history
2013–2016Based in Guandong, CN· patent location history
2014–2019Patents assigned to NOVATEK MICROELECTRONICS CORP (5)· patent assignee history
2014–2020Based in Shenzhen, CN· patent location history
2014–2020Based in Hsinchu County, TW· patent location history
2014–2017Based in Zhubei City, TW· patent location history
2015–2018Based in Guangdong, CN· patent location history
2016–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (10)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHENZHEN CHINA STAR OPTOELECT422013–2020
CHEN CHENG-HUNGself182013–2016
TAIWAN SEMICONDUCTOR MFG CO LTD102016–2020
TAIWAN SEMICONDUCTOR MFG82013–2015
NOVATEK MICROELECTRONICS CORP52014–2019
Locations
LocationPatentsSpan
Shenzhen, CN192014–2020
Guangdong, CN152015–2018
Hsinchu County, TW132014–2020
Guandong, CN82013–2016
Zhubei City, TW62014–2017