Inventor
Junko Yamanaka
Inventor
Chiba, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Fprimary
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation27%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein18%
C09KMaterials for miscellaneous applications, not provided for elsewhere9%
G06VImage or video recognition or understanding9%
H02MApparatus for conversion between ac and ac, between ac and dc, or between dc and dc, and for use with mains or similar power supply systems9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution9%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
PatentTitleYear
6,738,272'Charge pump rush current limiting circuit'20046,001,667'Method of manufacturing a semiconductor detector for detecting light and radiation'19995,763,903'Avalanche photodiode for light detection'19985,719,414'Photoelectric conversion semiconductor device with insulation film'19985,420,709'Liquid crystal spatial light modulator for edge detection employing diffusion in the photoconductive layer to enlarge image'19955,168,383'Liquid crystal device with Fabry-Perot etalon'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–2004Patents assigned to SEIKO INSTR INC (5)· patent assignee history
1992–1998Based in Tokyo, JP· patent location history
1998–2004Based in Chiba, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEIKO INSTR INC | 5 | 1992–2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chiba, JP | 3 | 1998–2004 |
| Tokyo, JP | 3 | 1992–1998 |