Inventor
MASAAKI KOTAKE
Inventor
JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds21%
C09DCoating compositions, e.g. paints, varnishes or lacquers13%
C07CAcyclic or carbocyclic compounds8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
C07DHeterocyclic compounds4%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds4%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
C08LCompositions of macromolecular compounds4%
H01BCables4%
PatentTitleYear
12,429,772Chemically amplified resist composition, photomask blank, method for forming resist pattern, and method for producing polymer compound202512,164,231Chemically amplified positive resist composition and resist pattern forming process202412,164,227Chemically amplified negative resist composition and resist pattern forming process202411,852,974Conductive polymer composition, coated product and patterning process202311,548,844Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process202311,429,023Onium salt, negative resist composition, and resist pattern forming process202211,231,650Chemically amplified negative resist composition and resist pattern forming process2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to SHINETSU CHEMICAL CO (7)· patent assignee history
2022–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 7 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 7 | 2022–2025 |