Inventor

Jorg Ohngemach

Inventor

Reinheim, DE

Overview

1978–2000

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds18%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%

C09DCoating compositions, e.g. paints, varnishes or lacquers8%

B65CLabelling or tagging machines, apparatus, or processes6%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds6%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients6%

C07CAcyclic or carbocyclic compounds4%

C09KMaterials for miscellaneous applications, not provided for elsewhere4%

C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds2%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1978–1995Patents assigned to MERCK PATENT GMBH (11)· patent assignee history

1978Based in Darmstadt, DE· patent location history

1985–2000Based in Reinheim, DE· patent location history

1991Based in Ohngemach, DE· patent location history

1996Patents assigned to CIBA GEIGY CORP (1)· patent assignee history

1998–2000Patents assigned to CIBA SC HOLDING AG (5)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations