Inventor

Todd Lanier Hylton

Inventor
Great Falls, VA, US

Overview

21→
Patents
1995–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material31%
H01JElectric discharge tubes or discharge lamps18%
G11BInformation storage based on relative movement between record carrier and transducer10%
B82YSpecific uses or applications of nanostructures6%
G01RMeasuring electric variables6%
H10NElectric solid-state devices not otherwise provided for6%
G02BOptical elements, systems or apparatus4%
H01FMagnets4%
B25JManipulators2%
G01DMeasuring not specially adapted for a specific variable2%
PatentTitleYear
9,849,588Apparatus and methods for remotely controlling robotic devices20177,316,764'System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signal'20086,843,891'Apparatus for sputter deposition'20056,819,871'Multi-channel optical filter and multiplexer formed from stacks of thin-film layers'20046,723,209'System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicals'20046,689,255'System and method for making thin-film structures using a stepped profile mask'20046,682,634'Apparatus for sputter deposition'20046,679,976'System and method for performing sputter deposition with multiple targets using independent ion and electron sources and independent target biasing with DC pulse signals'20046,610,179'System and method for controlling deposition thickness using a mask with a shadow that varies with respect to a target'20036,488,821'System and method for performing sputter deposition using a divergent ion beam source and a rotating substrate'20026,419,802'System and method for controlling deposition thickness by synchronously varying a sputtering rate of a target with respect to a position of a rotating substrate'20026,419,803'System and method for making thin-film structures using a stepped profile mask'20026,402,904'System and method for performing sputter deposition using independent ion and electron sources and a target biased with an a-symmetric bi-polar DC pulse signal'20026,402,901'System and method for performing sputter deposition using a spherical geometry'20026,402,905'System and method for controlling deposition thickness using a mask with a shadow that varies along a radius of a substrate'20026,402,900'System and method for performing sputter deposition using ion sources, targets and a substrate arranged about the faces of a cube'20026,016,241'Magnetoresistive sensor utilizing a granular magnetoresistive layer'20005,629,682'Magnetic recorder having MR read and inductive write capability'19975,492,775'Barium ferrite thin film for longitudinal recording'19965,476,680'Method for manufacturing granular multilayer mangetoresistive sensor'19955,452,163'Multilayer magnetoresistive sensor'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–2000Patents assigned to IBM (5)· patent assignee history
1995–2000Based in San Jose, CA, US· patent location history
2002–2008Patents assigned to WAVE INC 4 (9)· patent assignee history
2002–2004Patents assigned to 4WAVE INC (2)· patent assignee history
2002–2005Based in Great Falls, VA, US· patent location history
2002–2008Based in Vienna, VA, US· patent location history
2004–2005Patents assigned to KAUFMAN & ROBINSON INC (2)· patent assignee history
2004–2005Patents assigned to VEECO INSTR INC (2)· patent assignee history
2017Based in La Jolla, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
WAVE INC 492002–2008
IBM51995–2000
4WAVE INC22002–2004
KAUFMAN & ROBINSON INC22004–2005
VEECO INSTR INC22004–2005
Locations
LocationPatentsSpan
Great Falls, Virginia, US112002–2005
San Jose, California, US51995–2000
Vienna, Virginia, US42002–2008
La Jolla, California, US12017