Inventor
Hiroshi Takeno
Inventor
Annaka, JP
Overview
Patents· 32 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
C30BSingle-crystal growth16%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
H10DInorganic electric semiconductor devices8%
H01LSemiconductor devices6%
H03MCoding5%
H04NPictorial communication, e.g. television5%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G01RMeasuring electric variables2%
G06FElectric digital data processing2%
PatentTitleYear
10,886,129Method for manufacturing semiconductor device and method for evaluating semiconductor device202110,297,463Method for manufacturing silicon wafer20199,748,151'Method for evaluating semiconductor substrate'20179,530,702'Method for measuring recombination lifetime of silicon substrate'20168,729,676'Silicon epitaxial wafer and method for manufacturing the same'20148,410,573'SOI (silicon on insulator) structure semiconductor device and method of manufacturing the same'20138,338,277'Method for manufacturing SOI substrate'20128,268,705'Method for producing SOI wafer'20127,985,660'Method for manufacturing soi wafer'20117,910,455'Method for producing SOI wafer'20117,902,042'Method of manufacturing SOI wafer and thus-manufactured SOI wafer'20117,799,660'Method for manufacturing SOI substrate'20107,749,861'Method for manufacturing SOI substrate and SOI substrate'20107,311,888'Annealed wafer and method for manufacturing the same'20077,229,501'Silicon epitaxial wafer and process for manufacturing the same'20077,189,293'Method of producing annealed wafer and annealed wafer'20077,033,962'Methods for manufacturing silicon wafer and silicone epitaxial wafer, and silicon epitaxial wafer'20066,858,094'Silicon wafer and silicon epitaxial wafer and production methods therefor'20056,544,490'Silicon wafer and production method thereof and evaluation method for silicon wafer'20036,544,899'Process for manufacturing silicon epitaxial wafer'20036,544,332'Method for manufacturing silicon single crystal, silicon single crystal manufactured by the method, and silicon wafer'20036,478,883'Silicon single crystal wafer, epitaxial silicon wafer, and methods for producing them'20026,277,715'Production method for silicon epitaxial wafer'20016,264,906'Method for heat treatment of silicon substrate, substrate treated by the method, and epitaxial wafer utilizing the substrate'20016,206,961'Method of determining oxygen precipitation behavior in a silicon monocrystal'20016,143,071'Method for heat treatment of silicon substrate, substrate treated by the method, and epitaxial wafer utilizing the substrate'20005,636,279'Scramble apparatus and descramble apparatus'19975,625,355'Apparatus and method for decoding variable-length code'19975,604,499'Variable-length decoding apparatus'19975,598,452'Method of evaluating a silicon single crystal'19975,568,140'Header detector and associated decoding apparatus'19965,377,266'Scramble apparatus and descramble apparatus'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–1997Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (5)· patent assignee history
1994–1997Based in Kyoto, JP· patent location history
1997–2021Patents assigned to SHINETSU HANDOTAI KK (27)· patent assignee history
1997–2021Based in Annaka, JP· patent location history
2000–2016Based in Gunma, JP· patent location history
2012–2014Patents assigned to TAKENO HIROSHI (4)· patent assignee history
2012–2013Patents assigned to NOTO NOBUHIKO (2)· patent assignee history
2012–2013Patents assigned to YOSHIDA KAZUHIKO (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU HANDOTAI KK | 27 | 1997–2021 |
| MATSUSHITA ELECTRIC INDUSTRIAL CO LTD | 5 | 1994–1997 |
| TAKENO HIROSHIself | 4 | 2012–2014 |
| NOTO NOBUHIKO | 2 | 2012–2013 |
| YOSHIDA KAZUHIKO | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Annaka, JP | 15 | 1997–2021 |
| Gunma, JP | 12 | 2000–2016 |
| Kyoto, JP | 5 | 1994–1997 |