Inventor
Masahito Sugiura
Inventor
Nirasaki, JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
C23CCoating metallic material24%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
B82YSpecific uses or applications of nanostructures5%
C01BNon-metallic elements5%
H01LSemiconductor devices5%
B01DSeparation2%
B21DWorking or processing of sheet metal or metal tubes, rods or profiles without essentially removing material2%
B21JForging2%
B30BPresses in general2%
PatentTitleYear
10,041,174Method for forming carbon nanotubes and carbon nanotube film forming apparatus20189,662,705'Processing machine and bending method'20179,059,178'Method for forming carbon nanotubes and carbon nanotube film forming apparatus'20158,168,539'Method for forming tungsten film at a surface of a processing target material, film-forming apparatus, storage medium and semiconductor device with a tungsten film'20127,078,341'Method of depositing metal layers from metal-carbonyl precursors'20067,037,560'Film forming method, and film modifying method'20067,030,028'Etching method'20066,989,321'Low-pressure deposition of metal layers from metal-carbonyl precursors'20066,890,848'Fabrication process of a semiconductor device'20056,800,546'Film forming method by radiating a plasma on a surface of a low dielectric constant film'20046,467,491'Processing apparatus and processing method'20026,428,850'Single-substrate-processing CVD method of forming film containing metal element'20026,232,248'Single-substrate-heat-processing method for performing reformation and crystallization'20016,143,081'Film forming apparatus and method, and film modifying apparatus and method'20006,126,753'Single-substrate-processing CVD apparatus and method'20005,755,963'Filter element and fabrication method for the same'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998Based in Takahama, JP· patent location history
2000–2018Patents assigned to TOKYO ELECTRON LTD (11)· patent assignee history
2000–2006Based in Nirasaki, JP· patent location history
2002–2018Based in Yamanashi, JP· patent location history
2006Patents assigned to IBM (2)· patent assignee history
2006Based in Minami-Alps, JP· patent location history
2012Patents assigned to AIBA YASUSHI (1)· patent assignee history
2012Patents assigned to MIZOGUCHI YASUTAKA (1)· patent assignee history
2017Patents assigned to DENSO CORP (1)· patent assignee history
2017Based in Hekinan, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 11 | 2000–2018 |
| IBM | 2 | 2006 |
| AIBA YASUSHI | 1 | 2012 |
| DENSO CORP | 1 | 2017 |
| MIZOGUCHI YASUTAKA | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 7 | 2000–2006 |
| Yamanashi, JP | 5 | 2002–2018 |
| Minami-Alps, JP | 2 | 2006 |
| Hekinan, JP | 1 | 2017 |
| Takahama, JP | 1 | 1998 |