Inventor
Masayuki Hashitani
Inventor
Chiba, JP
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices40%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
G05FSystems for regulating electric or magnetic variables12%
G06FElectric digital data processing4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
PatentTitleYear
10,014,294Semiconductor integrated circuit device having enhancement type NMOS and depression type MOS with N-type channel impurity region and P-type impurity layer under N-type channel impurity region20189,804,628'Reference voltage generator'20179,552,009'Reference voltage generator having diode-connected depletion MOS transistors with same temperature coefficient'20179,524,961'Semiconductor device'20169,276,065'Semiconductor device and method of manufacturing the same'20169,213,415'Reference voltage generator'20158,847,308'Semiconductor device having a trench structure'20148,716,142'Semiconductor device and method of manufacturing the same'20148,643,093'Semiconductor device and method of manufacturing the same'20148,598,026'Semiconductor device and method of manufacturing the same'20138,236,648'Trench MOS transistor and method of manufacturing the same'20128,053,820'Semiconductor device and method of manufacturing the same'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2017Patents assigned to SEIKO INSTR INC (10)· patent assignee history
2011–2018Based in Chiba, JP· patent location history
2012–2014Patents assigned to HASHITANI MASAYUKI (4)· patent assignee history
2016–2018Patents assigned to SII SEMICONDUCTOR CORP (4)· patent assignee history
2018Patents assigned to ABLIC INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEIKO INSTR INC | 10 | 2011–2017 |
| HASHITANI MASAYUKIself | 4 | 2012–2014 |
| SII SEMICONDUCTOR CORP | 4 | 2016–2018 |
| ABLIC INC | 1 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chiba, JP | 12 | 2011–2018 |