Inventor
Hong-Seong Son
Inventor
Suwon-si, KR
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1020%
H10DInorganic electric semiconductor devices17%
B24BMachines, devices, or processes for grinding or polishing10%
H10BElectronic memory devices5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B01DSeparation2%
B07CPostal sorting2%
B08BCleaning in general2%
G01BMeasuring length, thickness or similar linear dimensions2%
PatentTitleYear
8,062,102'Polishing pads including slurry and chemicals thereon and methods of fabricating the same'20118,043,960'Contact structure of semiconductor devices and method of fabricating the same'20117,807,337'Inductor for a system-on-a-chip and a method for manufacturing the same'20107,645,695'Method of manufacturing a semiconductor element'20107,488,235'Polishing apparatus and related polishing methods'20097,365,021'Methods of fabricating a semiconductor device using an organic compound and fluoride-based buffered solution'20087,183,226'Method of forming a trench for use in manufacturing a semiconductor device'20077,180,188'Contact structure of semiconductor devices and method of fabricating the same'20077,066,785'Polishing apparatus and related polishing methods'20067,026,242'Method for filling a hole with a metal'20066,983,755'Cleaning method and cleaning apparatus for performing the same'20066,976,902'Chemical mechanical polishing apparatus'20056,924,234'Method and apparatus for polishing a copper layer and method for forming a wiring structure using copper'20056,924,207'Method of fabricating a metal-insulator-metal capacitor'20056,228,739'Pre-treatment method performed on a semiconductor structure before forming hemi-spherical grains of capacitor storage node'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2011Patents assigned to SAMSUNG ELECTRONICS CO LTD (14)· patent assignee history
2001Based in Kyungki-do, KR· patent location history
2005–2011Based in Suwon-si, KR· patent location history
2005–2011Based in Gyeonggi-do, KR· patent location history
2007Patents assigned to SAMSUNG ELECTRONICS OO LTD (1)· patent assignee history
2011Patents assigned to HA SANG-ROK (1)· patent assignee history
2011Patents assigned to LEE JONG-WON (1)· patent assignee history
2011Patents assigned to PARK MOO-YONG (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 14 | 2001–2011 |
| HA SANG-ROK | 1 | 2011 |
| LEE JONG-WON | 1 | 2011 |
| PARK MOO-YONG | 1 | 2011 |
| SAMSUNG ELECTRONICS OO LTD | 1 | 2007 |
Locations
| Location | Patents | Span |
|---|---|---|
| Suwon-si, KR | 8 | 2005–2011 |
| Gyeonggi-do, KR | 6 | 2005–2011 |
| Kyungki-do, KR | 1 | 2001 |