Inventor
Naoshige Takeda
Inventor
Utsunomiya, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices42%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests25%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds17%
C07DHeterocyclic compounds8%
H05KPrinted circuits8%
PatentTitleYear
6,235,436'Semiconductor device using positive photosensitive resin composition and process for preparation thereof'20016,071,666'Positive type photosensitive resin composition and semiconductor device using the same'20005,756,260'Photosensitive polyimide resin composition containing a stabilizer and method for formation of relief pattern using same'19985,648,451'Process for producing photosensitive resin'19975,449,584'Positive photo-sensitive resin composition comprising a photosensitive polybenzoxazole or a mixture of a polybenzoxazole, an organic solvent soluble polymer and a diazoquinone and/or a dihydropyridine compound'19955,206,337'Solvent-soluble polyimidesiloxane oligomer and process for producing the same'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2001Patents assigned to SUMITOMO BAKELITE CO (6)· patent assignee history
1993–1995Based in Yokohama, JP· patent location history
1997–2001Based in Utsunomiya, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SUMITOMO BAKELITE CO | 6 | 1993–2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| Utsunomiya, JP | 4 | 1997–2001 |
| Yokohama, JP | 2 | 1993–1995 |