Inventor
Atsushi Hosogane
Inventor
Iwama, JP
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1046%
G01RMeasuring electric variables38%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
G11BInformation storage based on relative movement between record carrier and transducer4%
PatentTitleYear
7,119,362'Method of manufacturing semiconductor apparatus'20066,864,568'Packaging device for holding a plurality of semiconductor devices to be inspected'20056,714,030'Semiconductor inspection apparatus'20046,573,112'Semiconductor device manufacturing method'20036,566,149'Method for manufacturing substrate for inspecting semiconductor device'20036,548,315'Manufacture method for semiconductor inspection apparatus'20036,531,327'Method for manufacturing semiconductor device utilizing semiconductor testing equipment'20036,511,857'Process for manufacturing semiconductor device'20036,507,204'Semiconductor testing equipment with probe formed on a cantilever of a substrate'20036,479,305'Semiconductor device manufacturing method'20026,465,264'Method for producing semiconductor device and apparatus usable therein'20026,358,762'Manufacture method for semiconductor inspection apparatus'20025,276,573'Slider unit controllably actuated at a surface of a moving information recording medium'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2004Patents assigned to HITACHI LTD (11)· patent assignee history
1994Based in Chiyoda-ku, JP· patent location history
2002–2006Based in Iwama, JP· patent location history
2002–2003Based in Ibaraki, JP· patent location history
2003Based in Tsuchiura, JP· patent location history
2005–2006Patents assigned to RENESAS TECH CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 11 | 1994–2004 |
| RENESAS TECH CORP | 2 | 2005–2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Iwama, JP | 9 | 2002–2006 |
| Ibaraki, JP | 2 | 2002–2003 |
| Tsuchiura, JP | 1 | 2003 |
| Chiyoda-ku, JP | 1 | 1994 |