Inventor
Lequn Liu
Inventor
Boise, ID, US
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H10DInorganic electric semiconductor devices15%
H10BElectronic memory devices13%
H10NElectric solid-state devices not otherwise provided for8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein5%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation5%
G09GArrangements or circuits for control of indicating devices using static means to present variable information3%
H01D3%
PatentTitleYear
10,566,364Resonant-filter image sensor and associated fabrication method202010,437,120Methods and systems for displaying high dynamic range images201910,317,733Method to make LCOS oxide alignment layer by offset print201910,290,670Resonant-filter image sensor and associated fabrication method20199,837,604Phase-change memory cell implant for dummy array leakage reduction20179,559,146'Phase-change memory cell implant for dummy array leakage reduction'20179,401,285'Chemical mechanical planarization topography control via implant'20169,324,945'Memory cells and methods of forming memory cells'20169,093,367'Methods of forming doped regions in semiconductor substrates'20158,906,771'Semiconductor processing methods, and methods of forming isolation structures'20148,709,929'Methods of forming semiconductor devices having diffusion regions of reduced width'20148,497,194'Methods of forming doped regions in semiconductor substrates'20138,283,708'Semiconductor devices and methods of forming semiconductor devices having diffusion regions of reduced width'20128,274,081'Semiconductor constructions'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2016Patents assigned to MICRON TECHNOLOGY INC (8)· patent assignee history
2012–2014Patents assigned to HU YONGJUN JEFF (4)· patent assignee history
2012–2014Patents assigned to LIU LEQUN (4)· patent assignee history
2012–2014Patents assigned to FULFORD JIM (2)· patent assignee history
2012–2017Based in Boise, ID, US· patent location history
2019–2020Patents assigned to OMNIVISION TECH INC (4)· patent assignee history
2019–2020Based in San Jose, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 8 | 2012–2016 |
| HU YONGJUN JEFF | 4 | 2012–2014 |
| LIU LEQUNself | 4 | 2012–2014 |
| OMNIVISION TECH INC | 4 | 2019–2020 |
| FULFORD JIM | 2 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 10 | 2012–2017 |
| San Jose, California, US | 4 | 2019–2020 |