Inventor
Hemant P. Mungekar
Inventor
Campbell, CA, US
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1034%
C23CCoating metallic material24%
H01JElectric discharge tubes or discharge lamps10%
H01LSemiconductor devices10%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation5%
G01BMeasuring length, thickness or similar linear dimensions2%
G05BControl or regulating systems in general2%
G06NComputing arrangements based on specific computational models2%
H05BElectric heating2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
PatentTitleYear
11,024,522Virtual sensor for spatially resolved wafer temperature control202111,004,710Wafer placement error detection based on measuring a current through an electrostatic chuck and solution for intervention202110,777,394Virtual sensor for chamber cleaning endpoint202010,636,630Processing chamber and method with thermal control20208,168,462'Passivation process for solar cell fabrication'20127,867,921'Reduction of etch-rate drift in HDP processes'20117,799,704'Gas baffle and distributor for semiconductor processing chamber'20107,745,350'Impurity control in HDP-CVD DEP/ETCH/DEP processes'20107,740,706'Gas baffle and distributor for semiconductor processing chamber'20107,704,897'HDP-CVD SiON films for gap-fill'20107,678,715'Low wet etch rate silicon nitride film'20107,628,897'Reactive ion etching for semiconductor device feature topography modification'20097,498,268'Gas delivery system for semiconductor processing'20097,329,586'Gapfill using deposition-etch sequence'20087,229,931'Oxygen plasma treatment for enhanced HDP-CVD gapfill'20077,141,138'Gas delivery system for semiconductor processing'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2021Patents assigned to APPLIED MATERIALS INC (16)· patent assignee history
2006–2010Based in San Jose, CA, US· patent location history
2008Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (1)· patent assignee history
2010–2021Based in Campbell, CA, US· patent location history
2012Patents assigned to BORDEN PETER (1)· patent assignee history
2012Patents assigned to MUNGEKAR HEMANT P (1)· patent assignee history
2012Patents assigned to OLSEN CHRISTOPHER S (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 16 | 2006–2021 |
| BORDEN PETER | 1 | 2012 |
| MATSUSHITA ELECTRIC INDUSTRIAL CO LTD | 1 | 2008 |
| MUNGEKAR HEMANT Pself | 1 | 2012 |
| OLSEN CHRISTOPHER S | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Campbell, California, US | 9 | 2010–2021 |
| San Jose, California, US | 7 | 2006–2010 |