Inventor
RYU NAGAI
Inventor
JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps31%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%
G05BControl or regulating systems in general15%
G06NComputing arrangements based on specific computational models8%
G06TImage data processing or generation, in general8%
H01LSemiconductor devices8%
PatentTitleYear
12,580,154Etching method and plasma processing apparatus202612,563,987Plasma processing method and plasma processing system202612,494,354Substrate processing system, information processing apparatus, and information processing method for dynamic control of substrate plasma processing202512,347,651Etching method and plasma processing apparatus202512,072,693Analysis device and analysis method2024Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2024–2026Patents assigned to TOKYO ELECTRON LTD (5)· patent assignee history
2024–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 5 | 2024–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 5 | 2024–2026 |