Inventor

Jih Shang Hwang

Inventor
Taoyuan, TW

Overview

2→
Patents
2005–2016
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B41Mprimary
B41MPrinting, duplicating, marking, or copying processes13%
B43LArticles for writing or drawing upon13%
B82YSpecific uses or applications of nanostructures13%
C09DCoating compositions, e.g. paints, varnishes or lacquers13%
C30BSingle-crystal growth13%
H01JElectric discharge tubes or discharge lamps13%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005Patents assigned to ACADEMIA SINICA (1)· patent assignee history
2005Based in Tau-Yuen, TW· patent location history
2016Patents assigned to HWANG JIH-SHANG (1)· patent assignee history
2016Based in Taoyuan, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ACADEMIA SINICA12005
HWANG JIH-SHANGself12016
Locations
LocationPatentsSpan
Taoyuan, TW12016
Tau-Yuen, TW12005