Inventor
Wei-Yu Su
Inventor
Taipei, TW
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
G09GArrangements or circuits for control of indicating devices using static means to present variable information13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
PatentTitleYear
7,968,258'System and method for photolithography in semiconductor manufacturing'20117,834,837'Active matrix liquid crystal display and driving method thereof'20107,796,249'Mask haze early detection'20107,514,184'Reticle with antistatic coating'20097,029,800'Reticle with antistatic coating'20066,948,619'Reticle pod and reticle with cut areas'20056,869,733'Pellicle with anti-static/dissipative material coating to prevent electrostatic damage on masks'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2011Patents assigned to TAIWAN SEMICONDUCTOR MFG (6)· patent assignee history
2005–2010Based in Taipei, TW· patent location history
2010Patents assigned to CHIMEI INNOLUX CORP (1)· patent assignee history
2010Based in Miaoli, TW· patent location history
2011Based in Banciao, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG | 6 | 2005–2011 |
| CHIMEI INNOLUX CORP | 1 | 2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Taipei, TW | 5 | 2005–2010 |
| Banciao, TW | 1 | 2011 |
| Miaoli, TW | 1 | 2010 |