Inventor
Maria Galiano
Inventor
San Jose, CA, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material43%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1036%
B01DSeparation7%
H01JElectric discharge tubes or discharge lamps7%
Y02CCapture, storage, sequestration or disposal of greenhouse gases [ghg]7%
PatentTitleYear
6,277,347'Use of ozone in process effluent abatement'20016,218,268'Two-step borophosphosilicate glass deposition process and related devices and apparatus'20016,177,344'BPSG reflow method to reduce thermal budget for next generation device including heating in a steam ambient'20016,009,827'Apparatus for creating strong interface between in-situ SACVD and PECVD silicon oxide films'20005,902,494'Method and apparatus for reducing particle generation by limiting DC bias spike'19995,814,377'Method and apparatus for creating strong interface between in-situ SACVD and PECVD silicon oxide films'19985,356,722'Method for depositing ozone/TEOS silicon oxide films of reduced surface sensitivity'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2001Patents assigned to APPLIED MATERIALS INC (7)· patent assignee history
1994–2000Based in San Jose, CA, US· patent location history
2001Based in Fishkill, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 7 | 1994–2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 4 | 1994–2000 |
| Fishkill, New York, US | 3 | 2001 |