Inventor

Masaaki Itou

Inventor

Higashimurayama, JP

Overview

1991–2019

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%

C10MLubricating compositions15%

C10NIndexing scheme associated with subclass c10m relating to lubricating compositions15%

G01BMeasuring length, thickness or similar linear dimensions7%

G01DMeasuring not specially adapted for a specific variable7%

G21KHandling of particles or ionising radiation not otherwise provided for7%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%

B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for4%

B82YSpecific uses or applications of nanostructures4%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1991–1995Patents assigned to HITACHI LTD (6)· patent assignee history

1991–1995Based in Higashimurayama, JP· patent location history

2006Based in Aichi, JP· patent location history

2014–2015Patents assigned to ITOU MASAAKI (3)· patent assignee history

2014–2015Patents assigned to NIPPON OIL CORP (3)· patent assignee history

2014–2015Patents assigned to KUROSAWA OSAMU (2)· patent assignee history

2014–2015Patents assigned to TAKAHASHI MASATO (2)· patent assignee history

2014–2015Based in Yokohama, JP· patent location history

2018Based in Tokyo, JP· patent location history

2019Based in Fukui, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations