Inventor
Sebastien Raoux
Inventor
San Francisco, CA, US
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material20%
H01JElectric discharge tubes or discharge lamps17%
B01DSeparation9%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry9%
Y02CCapture, storage, sequestration or disposal of greenhouse gases [ghg]8%
Y02PClimate change mitigation technologies in the production or processing of goods7%
H05HPlasma technique5%
F04BPositive-displacement machines for liquids2%
F23CMethods or apparatus for combustion using fluid fuel or solid fuel suspended in a carrier gas or air2%
F23DBurners2%
PatentTitleYear
7,970,483'Methods and apparatus for improving operation of an electronic device manufacturing system'20117,736,600'Apparatus for manufacturing a process abatement reactor'20107,700,049'Methods and apparatus for sensing characteristics of the contents of a process abatement reactor'20107,532,952'Methods and apparatus for pressure control in electronic device manufacturing systems'20097,160,521'Treatment of effluent from a substrate processing chamber'20077,004,107'Method and apparatus for monitoring and adjusting chamber impedance'20066,888,639'In-situ film thickness measurement using spectral interference at grazing incidence'20056,863,019'Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas'20056,680,420'Apparatus for cleaning an exhaust line in a semiconductor processing system'20046,517,913'Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions'20036,432,256'Implanatation process for improving ceramic resistance to corrosion'20026,366,346'Method and apparatus for optical detection of effluent composition'20026,358,573'Mixed frequency CVD process'20026,354,241'Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing'20026,193,802'Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment'20016,194,628'Method and apparatus for cleaning a vacuum line in a CVD system'20016,187,072'Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions'20016,162,709'Use of an asymmetric waveform to control ion bombardment during substrate processing'20006,136,388'Substrate processing chamber with tunable impedance'20006,098,568'Mixed frequency CVD apparatus'20006,045,618'Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment'20006,041,734'Use of an asymmetric waveform to control ion bombardment during substrate processing'20005,319,653'Integrated optical component structure'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994Patents assigned to FRANCE TELECOM (1)· patent assignee history
1994Based in Bordeaux, FR· patent location history
2000–2011Patents assigned to APPLIED MATERIALS INC (22)· patent assignee history
2000–2006Based in San Francisco, CA, US· patent location history
2001–2003Based in San Bernardino, CA, US· patent location history
2005–2007Based in Cupertino, CA, US· patent location history
2009–2011Based in Santa Clara, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 22 | 2000–2011 |
| FRANCE TELECOM | 1 | 1994 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Francisco, California, US | 14 | 2000–2006 |
| Santa Clara, California, US | 4 | 2009–2011 |
| Cupertino, California, US | 2 | 2005–2007 |
| San Bernardino, California, US | 2 | 2001–2003 |
| Bordeaux, FR | 1 | 1994 |