Inventor
Shun KIKUCHI
Inventor
JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
C07CAcyclic or carbocyclic compounds17%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them11%
H04NPictorial communication, e.g. television11%
C07DHeterocyclic compounds6%
C07JSteroids6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
G02BOptical elements, systems or apparatus6%
PatentTitleYear
12,554,197Positive resist composition and pattern forming process202612,535,733Molecular resist composition and patterning process202612,436,462Positive resist composition and pattern forming process202512,204,245Positive resist composition and patterning process202511,940,728Molecular resist composition and patterning process202411,567,392Imaging apparatus, imaging control method, interchangeable lens and diaphragm driving method202311,451,702Image capturing system and driving method for reducing noise in a captured image2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2023Patents assigned to SONY CORP (2)· patent assignee history
2022–2026Based in JP· patent location history
2024–2026Patents assigned to SHINETSU CHEMICAL CO (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 5 | 2024–2026 |
| SONY CORP | 2 | 2022–2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 7 | 2022–2026 |