Inventor
Yoshimi Isono
Inventor
Kawagoe, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Cprimary
C07CAcyclic or carbocyclic compounds20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds18%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
Y10TTechnical subjects covered by former us classification6%
C07DHeterocyclic compounds4%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
Y02PClimate change mitigation technologies in the production or processing of goods4%
PatentTitleYear
9,221,928'Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method'20158,846,966'Method for producing alkoxycarbonylfluoroalkanesulfonic acid salt'20148,809,451'Fluorinated dicarboxylic acid derivative and polymer obtained therefrom'20148,686,098'Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method'20148,663,903'Top coating composition'20148,592,622'Polymerizable fluorine-containing compound'20138,592,540'Fluorine-containing compound, fluorine-containing polymer compound, resist composition and patterning method using same'20138,513,457'Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same'20138,283,106'Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent'20128,187,787'Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same'20127,906,269'Positive-type resist composition'20117,887,990'Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same'20117,557,233'Method for synthesizing ionic complex'20096,849,752'Process for synthesizing ionic metal complex'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2015Patents assigned to CENTRAL GLASS CO LTD (14)· patent assignee history
2005Based in Saitama, JP· patent location history
2009–2015Based in Kawagoe, JP· patent location history
2012–2015Patents assigned to ISONO YOSHIMI (10)· patent assignee history
2012–2015Patents assigned to NARIZUKA SATORU (10)· patent assignee history
2012–2014Patents assigned to MAEDA KAZUHIKO (4)· patent assignee history
2013–2015Patents assigned to MORI KAZUNORI (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CENTRAL GLASS CO LTD | 14 | 2005–2015 |
| ISONO YOSHIMIself | 10 | 2012–2015 |
| NARIZUKA SATORU | 10 | 2012–2015 |
| MAEDA KAZUHIKO | 4 | 2012–2014 |
| MORI KAZUNORI | 4 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawagoe, JP | 13 | 2009–2015 |
| Saitama, JP | 1 | 2005 |